Multi-Band Gap Transitions and Sub-Band Gap in rGO/MgF2 Films for Optoelectronic Application
DOI:
https://doi.org/10.19184/cerimre.v8i2.7Keywords:
Multi-band gap, Sub-band gap, Plasmonic, optoelectronicAbstract
We report the temperature-dependent optical properties of reduced graphene oxide (rGO)/MgF₂ films, emphasizing the emergence of multi-band gap transitions and sub-band gap states for optoelectronic applications. rGO films were thermally annealed at varying temperatures (400°C and 800°C), and their optical response was analyzed using UV-VIS spectroscopy. As deposited rGO film with an annealed temperature of 400°C exhibited a single dominant band gap transition at 2.07 eV, characteristic of π–π* transitions. Upon annealing at 800°C, additional transitions appeared at 2.34 eV until 2.40 eV, indicating the development of multi-band gap behavior due to structural ordering, oxygen functional group removal, and the formation of localized defect states. The calculated Urbach energy (E_(u )) increased from 0.279 eV to 0.288 eV at 800°C, signifying increased disorder and sharper optical absorption edges. The synergistic effects of rGO’s tunable band structure and MgF₂’s dielectric properties offer a versatile platform for optoelectronic devices application, such as broadband photodetectors, multi-junction solar cells and plasmon-enhanced sensors.
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